Enhanced Electron Field Emission Properties of Conducting Ultrananocrystalline Diamond Films after Cu and Au Ion Implantation

doi:10.1021/am405954w

淡江大學機構典藏 > 理學院 > 物理學系暨研究所 > 期刊論文 > Item 987654321/99658

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題名:	Enhanced Electron Field Emission Properties of Conducting Ultrananocrystalline Diamond Films after Cu and Au Ion Implantation
作者:	Kamatchi Jothiramalingam Sankaran;Chen, Huang-Chin;Kalpataru Panda;Balakrishnan Sundaravel;Lee, Chi-Young;Tai, Nyan-Hwa;Lin, I-Nan
貢獻者:	淡江大學物理學系
關鍵詞:	ultrananocrystalline diamond films;ion implantation;nanographite;electron field emission;transmission electron microscopy;scanning tunneling spectroscopy
日期:	2014-04
上傳時間:	2014-12-09 10:53:17 (UTC+8)
出版者:	Washington, DC: American Chemical Society
摘要:	The effects of Cu and Au ion implantation on the structural and electron field emission (EFE) properties of ultrananocrystalline diamond (UNCD) films were investigated. High electrical conductivity of 186 (Ω•cm)-1 and enhanced EFE properties with low turn-on field of 4.5 V/μm and high EFE current density of 6.70 mA/cm2 have been detected for Au-ion implanted UNCD (Au-UNCD) films that are superior to those of Cu-ion implanted UNCD (Cu-UNCD) ones. Transmission electron microscopic investigations revealed that Au-ion implantation induced a larger proportion of nanographitic phases at the grain boundaries for the Au-UNCD films in addition to the formation of uniformly distributed spherically shaped Au nanoparticles. In contrast, for Cu-UNCD films, plate-like Cu nanoparticles arranged in the row-like pattern were formed, and only a smaller proportion of nanographite phases along the grain boundaries was induced. From current imaging tunneling spectroscopy and local current–voltage curves of scanning tunneling spectroscopic measurements, it is observed that the electrons are dominantly emitted from the grain boundaries. Consequently, the presence of nanosized Au particles and the induction of abundant nanographitic phases in the grain boundaries of Au-UNCD films are believed to be the authentic factors, ensuing in high electrical conductivity and outstanding EFE properties of the films.
關聯:	ACS Applied Materials and Interfaces 6(7), pp.4911−4919
DOI:	10.1021/am405954w
顯示於類別:	[物理學系暨研究所] 期刊論文

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