淡江大學機構典藏:Item 987654321/98207
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    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/98207


    Title: 晶圓片光阻劑塗抹厚度之灰預測研究
    Authors: 彭嵐霖;井民安;楊智旭
    Contributors: 淡江大學機械與機電工程學系
    Keywords: 晶圓片;光阻劑;灰預測;灰色模型GMO. l
    Date: 2001-10
    Issue Date: 2014-06-13 15:44:55 (UTC+8)
    Publisher: 雲林縣斗六市 : 雲林科技大學水土資源及防災科技研究中心
    Abstract: 由於晶圓在塗抹光阻劑時，利用離心力對稱之特性將光阻劑塗抹其上，這往往對我們，難以去估測出光阻劑塗抹於晶圓上的膜厚。本文藉由灰預測理論，架構起晶圓在塗抹光阻劑時之灰色模型GMO. l) .以提供當塗抹光阻劑時，時間及轉速之決策參考。實驗擷取的數撮主要是利用離心力對稱特性，得出光阻劑塗抹晶國時的膜厚。在控制時間與轉速兩因子，分別來擷取光阻劑之平均膜厚。我們將得到的數據處理成有規則性、有條理性以用來架構灰色模型，並得出一組最佳化灰預測數據，以估測出光組劑之平均膜厚的差異。
    Relation: 2001年灰色系統理論與應用學術研討會論文集=The 2001 seminar of applied grey system theory，頁C120-125
    Appears in Collections:[Graduate Institute & Department of Mechanical and Electro-Mechanical Engineering] Proceeding

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