English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 60861/93527 (65%)
造访人次 : 1496517      在线人数 : 11
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
搜寻范围 查询小技巧:
  • 您可在西文检索词汇前后加上"双引号",以获取较精准的检索结果
  • 若欲以作者姓名搜寻,建议至进阶搜寻限定作者字段,可获得较完整数据
  • 进阶搜寻


    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/97214


    题名: Development of diamond cathode materials for enhancing the electron field emission and plasma characteristics using two-step microwave plasma enhanced chemical vapor deposition process
    作者: Lou, Shiu-Cheng;Chen, Chu-lung;Srinivasu Kunuku;Leou, Keh-Chyang;Lee, Chi-Young;Chen, Huang-Chin;Lin, I-Nan
    贡献者: 淡江大學物理學系
    日期: 2014-03
    上传时间: 2014-03-18 10:29:47 (UTC+8)
    出版者: College Park: American Institute of Physics
    摘要: The enhancement on the plasma illumination characteristics of a cylindrical microplasma device due to the utilization of hybrid-diamond (HiD) films as cathode was systematically investigated. The improved plasma illumination behavior was closely related to the enhanced electron field emission (EFE) properties of the diamond films. The HiD films, which possessed better EFE properties, including lower turn-on field for inducing the EFE process [(E 0)efe = 2.7 V/μm] and higher EFE current density [(Je )efe = 2.8 mA/cm2, at 10.6 V/μm], resulted in superior illumination performance for the microplasma devices. The plasma can be triggered at a low threshold field of (Eth)pl. = 0.166 V/μm, attaining a large plasma current density of (Je)pl. = 9.6 mA/cm2 at an applied field of 0.266 V/μm (plasma density of ne = 1.70 × 1015 cm−3). The better EFE for the HiD films is ascribed to the unique granular structure of the films. Transmission electron microscopic studies revealed that the HiD films contained large diamond aggregates evenly distributed among the ultrasmall grain matrix. There presents a-few-layer graphite, surrounding the large aggregates that formed electron transport networks and improved the EFE properties for the HiD films. The superior EFE properties for the HiD cathode materials are the prime factor for improving plasma illumination characteristics for the cylindrical microplasma devices.
    關聯: Journal of Vacuum Science & Technology B 32(2), pp.021202(9pages)
    DOI: 10.1116/1.4864067
    显示于类别:[物理學系暨研究所] 期刊論文

    文件中的档案:

    档案 描述 大小格式浏览次数
    Development of diamond cathode materials for enhancing the electron field emission and plasma characteristics using two-step microwave plasma enhanced chemical vapor deposition process.pdf3458KbAdobe PDF1检视/开启
    index.html0KbHTML34检视/开启

    在機構典藏中所有的数据项都受到原著作权保护.

    TAIR相关文章

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - 回馈