Strong photoluminescence from N-V and Si-V in nitrogen-doped ultrananocrystalline diamond film using plasma treatment

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題名:	Strong photoluminescence from N-V and Si-V in nitrogen-doped ultrananocrystalline diamond film using plasma treatment
作者:	Ko, Tin-Yu;Liu, Yu-Lin;Sun, Kien-Wen;Lin, Yi-Jie;Fong, Shih-Chieh;Lin, I-Nan;Tai, Nyan-Hwa
貢獻者:	淡江大學物理學系
關鍵詞:	Ultrananocrystalline diamond;Nitrogen vacancy;Plasma;Photoluminescence;Color center
日期:	2013-05
上傳時間:	2014-03-18 10:04:29 (UTC+8)
出版者:	Lausanne: Elsevier S.A.
摘要:	Raman, photoluminescence, and transport properties of nitrogen-doped ultrananocrystal diamond (UNCD) films were investigated following treatment with low energy microwave plasma at room temperature. The conductivity of nitrogen-doped UNCD films treated by microwave plasma was found to decrease slightly due to the reduced grain boundaries. We speculate that the plasma generated vacancies in UNCD films and provided heat for further mobilizing the vacancies to combine with the impurities, which led to the formation of the silicon-vacancy (Si-V) and nitrogen-vacancy (N-V) defect centers. The generated color centers were found to be distributed uniformly in the samples using a PL mapping technique. The PL emitted by the plasma treated nitrogen-doped UNCD film was strongly enhanced in comparison with the untreated films.
關聯:	Diamond and Related Materials 35, pp.36-39
DOI:	10.1016/j.diamond.2013.03.009
顯示於類別:	[物理學系暨研究所] 期刊論文

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