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    Title: ArF準分子雷射加工鑽石膜之材料移除機制探討
    Authors: 周文成;趙崇禮;許嘉瑋
    Contributors: 淡江大學機械與機電工程學系
    Keywords: 準分子雷射;活化能;CVD鑽石膜
    Date: 2004-11
    Issue Date: 2014-03-07 11:43:48 (UTC+8)
    Publisher: Hsinchu, Taiwan : Chinese Society for Material Science
    Abstract: 鑽石因具有高硬度、高熱導係數、透光範圍廣和耐腐蝕等特性,所以已逐漸成為工程應用上最重要的材料之一;然因天然鑽石取得不易且價格昂貴等因素限制了其應用之廣度。目前使用化學氣相沉積法(CVD)沉積的多晶鑽石膜在許多方面已擁有與天然單晶鑽石極近似的物理特性,若能降低CVD鑽石膜表面粗糙度將使鑽石膜之應用增添極大之潛力。本文以ArF準分子雷射(.lambda.=193nm)拋光CVD鑽石膜,再分別以掃描式電子顯微鏡(SEM)、拉曼光譜儀與表面粗度儀觀察分析鑽石膜加工後之表面顯微結構及形貌之變化。根據拉曼光譜測量證明研究結果顯示CVD鑽石膜在經過雷射加工後其表面之部分鑽石結構會轉換成碳之其他相(石墨、無晶形碳、無晶形鑽石…等等)進而達成材料移除之目的。且有效地將表面粗度(Ra)在1000個脈衝內由未加工前的0.4μm以上降至加工後之0.1μm以下。
    Relation: 中國材料科學學會:2004CSMS論文集=Proceedings: the 2004 Annual Conference of the Chinese Society for Material Science,4頁
    Appears in Collections:[Graduate Institute & Department of Mechanical and Electro-Mechanical Engineering] Proceeding

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