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    题名: 設備綜合效率改善之研究:半導體產業之個案探討
    作者: 楊維楨;凌國榮
    贡献者: 淡江大學管理科學學系
    关键词: 半導體產業;個案研究;績效衡量;總體設備效能;晶圓製造;系統導入;Semiconductor Industry;Case Study;Performance Measurement;Overall Equipment Effectiveness;Wafer Fabrication;System Implementation
    日期: 2002-01
    上传时间: 2014-02-12 02:16:42 (UTC+8)
    摘要: 台灣半導體製造業的兩大原動力,是晶圓代工服務與記憶體IC產業,為了持續不斷的改進品質和生產效率,臺灣的半導體公司引進一套「設備綜合效率(OverallEquipment Effectiveness, OEE)」評價系統。藉由此系統可分析和分類出設備效率損失的原因,並提供追蹤生產力的有效方法、發掘問題和待採取的改善行動。 本研究以世界著名的晶圓代工服務公司--T公司,為實證研究個案,根據T公司建置OEE系統的經驗,提供有效的績效衡量指標、清楚分析效率損失的原因。首先介紹半導體產業的概況與製造流程,並分析其競爭環境;其次就建置OEE系統的方法,分成系統架構、設備自動化模式及資料結構三方面加以說明;接著以T公司為個案,提供實際改進OEE的情形;最後提出結論與建議,以供產業在實際應用時的參考。
    Wafer Foundry and Memory IC are two major driving forces for Taiwan'ssemiconductor manufacturing industry. In order to sustain continuationof improving the quality and productive efficiency in Taiwan, anOverall Equipment Effectiveness (OEE) evaluation system is introduced.By using this system, the causes of efficiency losses are analyzed andclassified to provide effective way of tracking the productivity andthe problems are pointed out together with the activities ofimprovement to be carried. In this study, world ranking famous WaferFoundry Company T is taken as experience case. From the experience inT Company, an OEE system is established; the effective index forperformance evaluation is provided to clearly analyze the causes ofefficiency losses that have to be improved. First the status andmanufacturing process of semiconductor industry is introduced; thecompetitive environment is analyzed. Next, the method of implementingOEE system is presented from system architecture, equipment automationand data structure three aspects. Then T Company is taken asillustrative example to show actual improvement of OEE. Theconclusions and the suggestion to industry are given in the last,which is worthy reference for practical application.
    關聯: 2002年兩岸管理科學暨經營決策學術研討會論文集,頁607-620
    显示于类别:[管理科學學系暨研究所] 會議論文

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