English  |  正體中文  |  简体中文  |  Items with full text/Total items : 62567/95223 (66%)
Visitors : 2526515      Online Users : 228
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version
    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/94945

    Title: 聚硫化苯與聚二氟乙烯摻合的界面相容性反應與物性之分析
    Other Titles: Characterization of Interfacial Compatibility and Physical Properties of Polyphenylene Sulfide and Polyvinylidene Fluoride Reactive Blends
    Authors: 周運昇;林達鎔;鄭廖平
    Contributors: 淡江大學化學工程學系
    Keywords: 聚硫化苯;聚偏二氟乙烯;摻合;界面相容性;電漿活化;Polyphenylene Sulfide;Polyvinylidene Fluoride;Blending;Interfacial Compatibility;Plasma Activation
    Date: 2001-01
    Issue Date: 2014-02-09 00:45:35 (UTC+8)
    Abstract: 本研究係利用電漿活化接枝技術,將不同單體(壓克力酸:AA及甲基丙烯酸環氧丙酯:GMA)接枝於聚二氟乙烯(PVDF)上,利用酸鹼滴定法及核磁共振儀分析來檢測接枝量。並將不同單體接枝量之改質PVDF利用摻合(Blending)技術,使其與聚硫化苯(PPS)充分混煉。利用電子顯微鏡(SEM)觀察聚摻合後之材料界面間相容性與相形態的變化,並以DSC的檢測摻合物之物理性質隨相容性的變化關係。
    This research covers the grafting of different monomers, Acrylic acid(AA) and Glycidyl methacrylate (GMA), to polyvinylidene fluoride(PVDF) by using technology of plasma reaction. The modified PVDF isblended with PPS by in-situ reactive process. The phase morphology andthe thermal behavior of blends are studied with SEM and DSC. Theinterfacial compatibility and physical property is observed anddiscussed.
    Relation: 第二十四屆高分子研討會論文專輯2001=Proceediings of the 24th ROC Polymer Symposium 2001
    Appears in Collections:[Graduate Institute & Department of Chemical and Materials Engineering] Proceeding

    Files in This Item:

    File Description SizeFormat
    聚硫化苯與聚二氟乙烯摻合的界面相容性反應與物性之分析_中文摘要.docx摘要19KbMicrosoft Word158View/Open
    聚硫化苯與聚二氟乙烯摻合的界面相容性反應與物性之分析_英文摘要.docx摘要18KbMicrosoft Word79View/Open

    All items in 機構典藏 are protected by copyright, with all rights reserved.

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - Feedback