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    Title: Preparation and characterization of nanosilica-filled color resist
    Authors: Lee, Chih-Kang;Hwang, Feng-Hsi;Chen, Ching-Chung;Chang, Cheng-Liang;Cheng, Liao-Ping
    Contributors: 淡江大學化學工程與材料工程學系
    Keywords: Coatings;Color filter;Composites;Nanoparticles;Photoresists
    Date: 2012
    Issue Date: 2013-05-14 09:16:46 (UTC+8)
    Publisher: Hoboken: John Wiley & Sons, Inc.
    Abstract: Nanosilica-filled red, green, and blue color resists were prepared and their optical, thermal, and mechanical properties were examined. It was found that the International Commission on Illumination color coordinates of the formed resists varied with the concentration of silica in the resist. When the silica content was controlled within 15 phr, the color coordinates fell within the range for TFT–LCD applications. Furthermore, the pencil hardness and the thermal decomposition temperature of the resists increased with increasing silica content, however, at the expense of optical transmittance and resolution. The optimized amount of silica was 10, 15, and 10 phr for red, green, and blue resists, respectively. At these dosages, the synthesized resists had high hardness of 4 H, good thermal stability, and optical performance that met industrial criteria.
    Relation: Advances in Polymer Technology 31(2), pp.163–171
    DOI: 10.1002/adv.20247
    Appears in Collections:[Graduate Institute & Department of Chemical and Materials Engineering] Journal Article

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