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https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/89104
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| 題名: | Preparation and characterization of nanosilica-filled color resist |
| 作者: | Lee, Chih-Kang;Hwang, Feng-Hsi;Chen, Ching-Chung;Chang, Cheng-Liang;Cheng, Liao-Ping |
| 貢獻者: | 淡江大學化學工程與材料工程學系 |
| 關鍵詞: | Coatings;Color filter;Composites;Nanoparticles;Photoresists |
| 日期: | 2012 |
| 上傳時間: | 2013-05-14 09:16:46 (UTC+8) |
| 出版者: | Hoboken: John Wiley & Sons, Inc. |
| 摘要: | Nanosilica-filled red, green, and blue color resists were prepared and their optical, thermal, and mechanical properties were examined. It was found that the International Commission on Illumination color coordinates of the formed resists varied with the concentration of silica in the resist. When the silica content was controlled within 15 phr, the color coordinates fell within the range for TFT–LCD applications. Furthermore, the pencil hardness and the thermal decomposition temperature of the resists increased with increasing silica content, however, at the expense of optical transmittance and resolution. The optimized amount of silica was 10, 15, and 10 phr for red, green, and blue resists, respectively. At these dosages, the synthesized resists had high hardness of 4 H, good thermal stability, and optical performance that met industrial criteria. |
| 關聯: | Advances in Polymer Technology 31(2), pp.163–171 |
| DOI: | 10.1002/adv.20247 |
| 顯示於類別: | [化學工程與材料工程學系暨研究所] 期刊論文
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