English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 57615/91160 (63%)
造訪人次 : 13541128      線上人數 : 283
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋
    請使用永久網址來引用或連結此文件: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/89104

    題名: Preparation and characterization of nanosilica-filled color resist
    作者: Lee, Chih-Kang;Hwang, Feng-Hsi;Chen, Ching-Chung;Chang, Cheng-Liang;Cheng, Liao-Ping
    貢獻者: 淡江大學化學工程與材料工程學系
    關鍵詞: Coatings;Color filter;Composites;Nanoparticles;Photoresists
    日期: 2012
    上傳時間: 2013-05-14 09:16:46 (UTC+8)
    出版者: Hoboken: John Wiley & Sons, Inc.
    摘要: Nanosilica-filled red, green, and blue color resists were prepared and their optical, thermal, and mechanical properties were examined. It was found that the International Commission on Illumination color coordinates of the formed resists varied with the concentration of silica in the resist. When the silica content was controlled within 15 phr, the color coordinates fell within the range for TFT–LCD applications. Furthermore, the pencil hardness and the thermal decomposition temperature of the resists increased with increasing silica content, however, at the expense of optical transmittance and resolution. The optimized amount of silica was 10, 15, and 10 phr for red, green, and blue resists, respectively. At these dosages, the synthesized resists had high hardness of 4 H, good thermal stability, and optical performance that met industrial criteria.
    關聯: Advances in Polymer Technology 31(2), pp.163–171
    DOI: 10.1002/adv.20247
    顯示於類別:[化學工程與材料工程學系暨研究所] 期刊論文


    檔案 描述 大小格式瀏覽次數



    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - 回饋