English  |  正體中文  |  简体中文  |  Items with full text/Total items : 52047/87178 (60%)
Visitors : 8704649      Online Users : 132
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version
    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/89104

    Title: Preparation and characterization of nanosilica-filled color resist
    Authors: Lee, Chih-Kang;Hwang, Feng-Hsi;Chen, Ching-Chung;Chang, Cheng-Liang;Cheng, Liao-Ping
    Contributors: 淡江大學化學工程與材料工程學系
    Keywords: Coatings;Color filter;Composites;Nanoparticles;Photoresists
    Date: 2012
    Issue Date: 2013-05-14 09:16:46 (UTC+8)
    Publisher: Hoboken: John Wiley & Sons, Inc.
    Abstract: Nanosilica-filled red, green, and blue color resists were prepared and their optical, thermal, and mechanical properties were examined. It was found that the International Commission on Illumination color coordinates of the formed resists varied with the concentration of silica in the resist. When the silica content was controlled within 15 phr, the color coordinates fell within the range for TFT–LCD applications. Furthermore, the pencil hardness and the thermal decomposition temperature of the resists increased with increasing silica content, however, at the expense of optical transmittance and resolution. The optimized amount of silica was 10, 15, and 10 phr for red, green, and blue resists, respectively. At these dosages, the synthesized resists had high hardness of 4 H, good thermal stability, and optical performance that met industrial criteria.
    Relation: Advances in Polymer Technology 31(2), pp.163–171
    DOI: 10.1002/adv.20247
    Appears in Collections:[化學工程與材料工程學系暨研究所] 期刊論文

    Files in This Item:

    File Description SizeFormat

    All items in 機構典藏 are protected by copyright, with all rights reserved.

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - Feedback