Fabricating microstructures on CVD diamond film

淡江大學機構典藏 > 工學院 > 機械與機電工程學系暨研究所 > 期刊論文 > Item 987654321/89052

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题名:	Fabricating microstructures on CVD diamond film
作者:	Chao, Choung-Lii;Chou, Wen-Chen;Lin, Wen-Chung;Su, Wei-Jhe;Ma, Kung-Jeng
贡献者:	淡江大學機械與機電工程學系
关键词:	CVD diamond film;thermal annealing;reactive ion etching;RIE;microstructure
日期:	2012
上传时间:	2013-05-08 12:04:00 (UTC+8)
出版者:	Olney: Inderscience Publishers
摘要:	Diamond has many advanced properties which may provide potential solutions to various engineering problems. This study focuses on fabricating micro-structures on CVD diamond film. A thin layer of Au or Pt together with thermal annealing process is used to form micro–masks and reactive ion etching (RIE) method was subsequently adopted in this research to etch and fabricate micro–structures. Field emission scanning electron microscope (FESEM) and micro Raman spectroscopy were used to observe and analyse the morphology and composition of the obtained microstructures. Results show that different coated materials and thickness can produce different types of micro–masks and, as a consequence, different microstructures. Depending on the micro–mask, whisker–like or pillar–like microstructures are successfully produced and, based on the micro Raman spectrum; these microstructures still retains good diamond quality.
關聯:	International Journal of Surface Science and Engineering 6(1/2), pp.59-70
DOI:	10.1504/IJSURFSE.2012.046842
显示于类别:	[機械與機電工程學系暨研究所] 期刊論文

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