Fabricating microstructures on CVD diamond film

doi:10.1504/IJSURFSE.2012.046842

機構典藏 > College of Engineering > Graduate Institute & Department of Mechanical and Electro-Mechanical Engineering > Journal Article > Item 987654321/89052

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Title:	Fabricating microstructures on CVD diamond film
Authors:	Chao, Choung-Lii;Chou, Wen-Chen;Lin, Wen-Chung;Su, Wei-Jhe;Ma, Kung-Jeng
Contributors:	淡江大學機械與機電工程學系
Keywords:	CVD diamond film;thermal annealing;reactive ion etching;RIE;microstructure
Date:	2012
Issue Date:	2013-05-08 12:04:00 (UTC+8)
Publisher:	Olney: Inderscience Publishers
Abstract:	Diamond has many advanced properties which may provide potential solutions to various engineering problems. This study focuses on fabricating micro-structures on CVD diamond film. A thin layer of Au or Pt together with thermal annealing process is used to form micro–masks and reactive ion etching (RIE) method was subsequently adopted in this research to etch and fabricate micro–structures. Field emission scanning electron microscope (FESEM) and micro Raman spectroscopy were used to observe and analyse the morphology and composition of the obtained microstructures. Results show that different coated materials and thickness can produce different types of micro–masks and, as a consequence, different microstructures. Depending on the micro–mask, whisker–like or pillar–like microstructures are successfully produced and, based on the micro Raman spectrum; these microstructures still retains good diamond quality.
Relation:	International Journal of Surface Science and Engineering 6(1/2), pp.59-70
DOI:	10.1504/IJSURFSE.2012.046842
Appears in Collections:	[Graduate Institute & Department of Mechanical and Electro-Mechanical Engineering] Journal Article

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