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    題名: 非線性漣漪結構的製造
    其他題名: Fabrication of non-linear ripple structure
    作者: 簡呈安;Jian, Cheng-An
    貢獻者: 淡江大學機械與機電工程學系碩士班
    林清彬;Lin, Ching-Bin
    關鍵詞: 轉印;非線性漣漪結構;imprint;non-linear ripple structure
    日期: 2012
    上傳時間: 2013-04-13 11:56:30 (UTC+8)
    摘要: 本研究已成功地將固化後楊氏模數為2.953MPa及0.250MPa之PDMS溶膠,藉由轉印技術,將波長為9523nm、9142 nm、8571 nm、8490 nm及6470nm、4940 nm、4700 nm、3520 nm漣漪結構之軟性模仁,分別轉印成楊氏模數為0.250MPa 及2.953MPa漣漪結構的PDMS薄膜。將轉印的PDMS薄膜分別依20%、40%、60%及80%的伸長率,給予平行及垂直於先前漣漪方向之單軸向拉伸並固定其伸長率後,經由鍍金10A厚度及回復應力後,可得到:1. 交合彎曲狀;2. 樹根狀;3.交錯狀及4.扭曲狀四種非線性漣漪結構圖案。
    The present study purposes a novel method for making a non-linear ripple structure. First, A tension stress was applied in various Young’s modulus(E) of the polydimethylsiloxane (PDMS) film, next the following steps was should be done: fixing the tensile strain(20%, 40%, 60% and 80%) on the film, A gold layer of 10A was deposited onto the constrained PDMS film, and then releasing the strain, wavelength 9523nm、9142 nm、8571 nm、8490 nm for 2.953MPa PDMS film and 6470nm、4940 nm、4700 nm、3520 nm for 0.250MPa PDMS film ripple structure of soft masters were made, respectively. Second, E=2.953Mpa and E=0.250Mpa PDMS films replicated by imprinting method each other. And then, a tension direction corresponding to the ripple direction of prior PDMS film was applied vertical and parallel in the replicated-PDMS film, respectively. Next fixing the tensile strain (20%, 40%, 60% and 80%) on the film, a gold layer of 10A was deposited onto the constrained PDMS film, and then releasing the strain, four non-linear ripple structures were found.
    顯示於類別:[機械與機電工程學系暨研究所] 學位論文

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