English  |  正體中文  |  简体中文  |  Items with full text/Total items : 49258/83761 (59%)
Visitors : 7139129      Online Users : 54
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version
    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/83175


    Title: Depth Profiling Photoelectron-Spectroscopic Study of an Organic Spin Valve with a Plasma-Modified Pentacene Spacer
    Authors: Jhen-Yong Hong;Yin-Ming Chang;Chuang, Cheng-Hao;Kai-Shin Li;You-Cih Jhang;Hung-Wei Shiu;Chia-Hao Chen;Wen-Chung Chiang;Minn-Tsong Lin
    Contributors: 淡江大學物理學系
    Date: 2012-09-28
    Issue Date: 2013-03-14 14:07:12 (UTC+8)
    Publisher: American Chemical Society
    Abstract: We report an enhanced magnetoresistance (MR) in an organic spin valve with an oxygen plasma-treated pentacene (PC) spacer. The spin valve containing PC without the treatment shows no MR effect, whereas those with moderately plasma-treated PC exhibit MR ratios up to 1.64% at room temperature. X-ray photoelectron spectroscopy with depth profiling is utilized to characterize the interfacial electronic properties of the plasma-treated PC spacer which shows the formation of a derivative oxide layer. The results suggest an alternative approach to improve the interface quality and in turn to enhance the MR performance in organic spin valves.
    Relation: Journal of Physical Chemistry C 116(40), pp.21157−21161
    DOI: 10.1021/jp3026557
    Appears in Collections:[物理學系暨研究所] 期刊論文

    Files in This Item:

    File Description SizeFormat
    Depth profiling photoelectro-scpectroscopic study of an organic spin valve with a plasma-modified pentacene spacer, JPCC 116 (2012).pdf1284KbAdobe PDF225View/Open
    index.html0KbHTML114View/Open

    All items in 機構典藏 are protected by copyright, with all rights reserved.


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - Feedback