Loading...
|
Please use this identifier to cite or link to this item:
https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/80058
|
Title: | Preparation of water-resistant antifog hard coatings on plastic substrate |
Authors: | Chang, Chao-Ching;Huang, Feng-Hsi;Chang, Hsu-Hsien;Don, Trong-Ming;Chen, Ching-Chung;Cheng, Liao-Ping |
Contributors: | 淡江大學化學工程與材料工程學系 |
Date: | 2012-11-22 |
Issue Date: | 2013-01-17 09:34:25 (UTC+8) |
Publisher: | American: American Chemical Society |
Abstract: | A novel water resistant antifog (AF) coating for plastic substrates was developed, which has a special hydrophilic/hydrophobic bilayer structure. The bottom layer, acting both as a mechanical support and a hydrophobic barrier against water penetration, is an organic–inorganic composite comprising colloidal silica embedded in a cross-linked network of dipentaethritol hexaacrylate (DPHA). Atop this layer, an AF coating is applied, which incorporates a superhydrophilic species synthesized from Tween-20 (surfactant), isophorone diisocyanate (coupling agent), and 2-hydroxyethyl methacrylate (monomer). Various methods, e.g., FTIR, SEM, AFM, contact angle, and steam test, were employed to characterize the prepared AF coatings. The results indicated that the size and the continuity of the hydrophilic domains on the top surface increased with increasing added amount of T20, however, at the expense of hardness, adhesiveness, and water resistivity. The optimal T20 content was found to be 10 wt %, at which capacity the resultant AF coating was transparent and wearable (5H, hardness) and could be soaked in water for 7 days at 25 °C without downgrading of its AF capability. |
Relation: | Langmuir 28(49), pp.17193-17201 |
DOI: | 10.1021/la304176k |
Appears in Collections: | [化學工程與材料工程學系暨研究所] 期刊論文
|
Files in This Item:
File |
Description |
Size | Format | |
index.html | | 0Kb | HTML | 482 | View/Open | index.html | | 0Kb | HTML | 360 | View/Open | Preparation of water-resistant antifog hard coatings on plastic substrate.pdf | | 1857Kb | Adobe PDF | 1 | View/Open |
|
All items in 機構典藏 are protected by copyright, with all rights reserved.
|