English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 60696/93562 (65%)
造访人次 : 1046690      在线人数 : 20
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
搜寻范围 查询小技巧:
  • 您可在西文检索词汇前后加上"双引号",以获取较精准的检索结果
  • 若欲以作者姓名搜寻,建议至进阶搜寻限定作者字段,可获得较完整数据
  • 进阶搜寻


    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/78971


    题名: Direct observation and mechanism of increased emission sites in Fe-coated microcrystalline diamond films
    作者: Panda, Kalpataru;Sundaravel, B.;Panigrahi, B. K.;Huang, Pin-chang;Shih, Wen-ching;Chen, Huang-chin;Lin, I-nan
    贡献者: 淡江大學物理學系
    日期: 2012-06
    上传时间: 2012-11-07 15:05:50 (UTC+8)
    出版者: American Institute of Physics(AIP)
    摘要: The electron field emission (EFE) properties of microcrystalline diamond(MCD) films are significantly enhanced due to the Fe coating and post-annealing processes. The 900 °C post-annealed Fe coated diamond films exhibit the best EFE properties, with a turn on field (E0) of 3.42 V/μm and attain EFE current density (Je) of 170 μA/cm2 at 7.5 V/μm. Scanning tunnelling spectroscopy (STS) in current imaging tunnelling spectroscopy mode clearly shows the increased number density of emission sites in Fe-coated and post-annealed MCD films than the as-prepared ones. Emission is seen from the boundaries of the Fe (or Fe3C) nanoparticles formed during the annealing process. In STS measurement, the normalized conductance dI/dVI/V versus V curves indicate nearly metallic band gap, at the boundaries of Fe (or Fe3C) nanoparticles. Microstructural analysis indicates that the mechanism for improved EFE properties is due to the formation of nanographite that surrounds the Fe (or Fe3C) nanoparticles.
    關聯: Journal of Applied Physics 111(12), pp.124309 (9 pages)
    DOI: 10.1063/1.4729836
    显示于类别:[物理學系暨研究所] 期刊論文

    文件中的档案:

    档案 描述 大小格式浏览次数
    1.4729836.pdf3311KbAdobe PDF428检视/开启
    index.html0KbHTML276检视/开启

    在機構典藏中所有的数据项都受到原著作权保护.

    TAIR相关文章

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - 回馈