English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 54025/88770 (61%)
造訪人次 : 10547927      線上人數 : 25
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋
    請使用永久網址來引用或連結此文件: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/78969


    題名: Bias-enhanced nucleation and growth processes for improving the electron field emission properties of diamond films
    作者: Teng, Kuang-yau;Chen, Huang-chin;Tzeng, Gaung-chin;Tang, Chen-yau;Cheng, Hsiu-fung;Lin, I-nan
    貢獻者: 淡江大學物理學系
    日期: 2012-03
    上傳時間: 2012-11-07 15:00:58 (UTC+8)
    出版者: College Park: American Institute of Physics(AIP)
    摘要: The evolution of diamond films in bias-enhanced-nucleation (BEN) and bias-enhanced-growth (BEG) processes was systematically investigated. While the BEN process can efficiently form diamond nuclei on the Si substrates, BEG with large enough applied field (> –400 V) and for sufficiently long periods (>60 min) was needed to develop proper granular structure for the diamond films so as to enhance the electron field emission (EFE) properties of the films. For the films BEG under -400 V for 60 min (after BEN for 10 min), the EFE process can be turned on at a field as small as 3.6 V/μm, attaining a EFE current density as large as 325 μA/cm2 at an applied field of 15 V/μm. Such an EFE behavior is even better than that of the ultrananocrystalline diamond films grown in CH4/Ar plasma. Transmission electron microscopic examination reveals that the prime factor enhancing the EFE properties of these films is the induction of the nano-graphite filaments along the thickness of the films that facilitates the transport of electrons through the films.
    關聯: Journal of Applied Physics 111(5), 053701(10pages)
    DOI: 10.1063/1.3687918
    顯示於類別:[物理學系暨研究所] 期刊論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    1.3687918.pdf4508KbAdobe PDF416檢視/開啟
    index.html0KbHTML201檢視/開啟
    index.html0KbHTML48檢視/開啟

    在機構典藏中所有的資料項目都受到原著作權保護.

    TAIR相關文章

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - 回饋