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    題名: 漣漪差排之爬升機制
    其他題名: Climb mechanism of ripple dislocations
    作者: 阮俊傑;Juan, Chun-Chieh
    貢獻者: 淡江大學機械與機電工程學系碩士班
    林清彬
    關鍵詞: 漣漪差排;爬升;應力緩和;Ripple dislocation;Climb;Stress relaxation
    日期: 2011
    上傳時間: 2011-12-28 19:13:08 (UTC+8)
    摘要: 溫度及漣漪差排型態對漣漪差排爬升的影響已被研究。將同時具有漣漪差排與漣漪結構的PDMS薄膜給予一固定拉伸應變後,置於40℃-70℃恆溫系統中,由於溫度驅動力使漣漪差排前緣PDMS產生應變回復,在金鍍層無法回復下,漣漪差排前緣再次產生挫曲使得漣漪繼續向前成長,產生所謂漣漪差排的爬升現象。由於較高溫度造成較多的應力緩和,使得漣漪差排爬升速度隨溫度增加而降低。Y型漣漪差排前緣之尖端位於波峰,晶格漣漪差排前緣之尖端位於波谷,所以晶格漣漪差排前緣厚度較Y型漣漪差排薄,在同樣工作溫度下,會產生較大的應變回復,使得晶格漣漪差排的爬升速度較Y型漣漪差排快。
    The climbing mechanism of the ripple dislocation has been investigated. A constrained-tension strain was applied in the polydimethylsiloxane (PDMS) film with ripple dislocations, and then went through annealed treatment at a constant temperature environment. The annealing effect will be induced obviously stress relaxation at the front of the ripple dislocation and the instability of stress was observed simultaneously appearing on the front, thus the front of the ripple dislocation buckled again and further enhanced climbing of the ripple dislocation.
    In addition, this study also explored the effect of temperature and the type of the ripple dislocation on climbing velocity. This experiment reveals the climbing velocity of the ripple dislocation decreases in the temperature (40℃~70℃) and the lattice ripple dislocation s faster than the Y-type ripples dislocations.
    顯示於類別:[機械與機電工程學系暨研究所] 學位論文

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