定位平台在各種領域應用範圍廣泛，定位平台的定位能力往往影響儀器設備的性能，平台的定位能力則與位移感測技術息息相關。為了使量測與定位的精度提高，本文選擇不易受環境干擾的繞射式雷射光學尺作為精密定位平台的回授裝置，以控制步進馬達與壓電平台。 本文整合本實驗室所開發的繞射式雷射光學尺技術與商用奈米級移動台，建構出一個奈米級定位平台，並針對步進馬達、壓電致動器、雷射光學尺回授系統與解相位演算法進行探討，使該定位平台可應用於各領域之奈米定位。實驗結果顯示，本系統行程30 um與HP5529A的最大差異量為12.043 nm、60 um與HP5529A的最大差異量為15.371 nm、360 um與HP5529A的最大差異量為5.74 um、行程10.8 mm與HP5529A的最大差異量為62.191 um。 The positioning technique are widely used in various fields. Its positioning ca-pability of the stage usually influences the performance of the instruments or machines. The positioning capability of the stage, however, strongly depends on the displacement sensing technique. In order to raise the precision of the measurement and positioning, we adopted the laser encoder to serve as the feedback system, which can effectively slash the environmental disturbance. We integrated it and the actua-tor to control the positioning stage. In this study, we integrated the laser encoder, which was developed by our labor-atory, and the nanopositioning stage to construct a new positioner. We also studied the step motor, the piezoelectric actuator, the laser encoder feedback system and the phase decoding algorithm for the positioning stage. According to our experimental results, the maximum discrepancy between our system and HP5529A in 30 um range is 12.043 nm, the maximum discrepancy between our system and HP5529A in 60 um is 15.371 nm, the maximum discrepancy between our system and HP5529A in 360 um is 5.74 um, the maximum discrepancy between our system and HP5529A in 10.8 mm is 62.191 um.