淡江大學機構典藏:Item 987654321/73498
English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 62830/95882 (66%)
造访人次 : 4036142      在线人数 : 805
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
搜寻范围 查询小技巧:
  • 您可在西文检索词汇前后加上"双引号",以获取较精准的检索结果
  • 若欲以作者姓名搜寻,建议至进阶搜寻限定作者字段,可获得较完整数据
  • 进阶搜寻


    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/73498


    题名: Freestanding Ultrananocrystalline Diamond Films with Homojunction Insulating Layer on Conducting Layer and Their High Electron Field Emission Properties
    作者: Thomas, Joseph P.;Chen, Huang-Chin;Tai, Nyan-Hwa;Lin, I-Nan
    贡献者: 淡江大學物理學系
    关键词: ultrananocrystalline diamond;freestanding films;homojunction interface;n-type semiconducting diamond;insulating diamond;electron field emission
    日期: 2011
    上传时间: 2011-10-25 11:37:25 (UTC+8)
    出版者: Washington, DC: American Chemical Society
    摘要: Freestanding ultrananocrystalline diamond (UNCD) films with homojunction insulating layer in situ grown on a conducting layer showed superior electron field emission (EFE) properties. The insulating layer of the films contains large dendrite type grains (400–600 nm in size), whereas the conducting layer contains nanosize equi-axed grains (5–20 nm in size) separated by grain boundaries of about 0.5–1 nm in width. The conducting layer possesses n-type (or semimetallic) conductivity of about 5.6 × 10–3 (Ω cm)−1, with sheet carrier concentration of about 1.4 × 1012 cm–2, which is ascribed to in situ doping of Li-species from LiNbO3 substrates during growth of the films. The conducting layer intimately contacts the bottom electrodes (Cu-foil) by without forming the Schottky barrier, form homojunction with the insulating layer that facilitates injection of electrons into conduction band of diamond, and readily field emitted at low applied field. The EFE of freestanding UNCD films could be turned on at a low field of E0 = 10.0 V/μm, attaining EFE current density of 0.2 mA/cm2 at an applied field of 18.0 V/μm, which is superior to the EFE properties of UNCD films grown on Si substrates with the same chemical vapor deposition (CVD) process. Such an observation reveals the importance in the formation of homojunction on enhancing the EFE properties of materials. The large grain granular structure of the freestanding UNCD films is more robust against harsh environment and shows high potential toward diamond based electronic applications.
    關聯: ACS applied materials & interfaces 3(10), pp.4007–4013
    DOI: 10.1021/am200867c
    显示于类别:[物理學系暨研究所] 期刊論文

    文件中的档案:

    档案 描述 大小格式浏览次数
    Freestanding Ultrananocrystalline Diamond Films with Homojunction Insulating Layer on Conducting Layer and Their High Electron Field Emission Properties.pdf4279KbAdobe PDF1检视/开启
    index.html0KbHTML283检视/开启
    index.html0KbHTML54检视/开启

    在機構典藏中所有的数据项都受到原著作权保护.

    TAIR相关文章

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - 回馈