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    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/7290


    Title: 快速微影製作次微/奈米金屬模仁暨UV膠壓印成型研究
    Other Titles: Study on Fast Lithography for Fabricating Metallic Sub-Micro/Nano-Stamps and Forming of UV Resins Using Imprinting Method
    Authors: 林清彬
    Contributors: 淡江大學機械與機電工程學系
    Date: 2006
    Issue Date: 2009-03-16 15:52:58 (UTC+8)
    Abstract: 本研究在室溫下利用沉積一層相變化材料,接著使用飛秒雷射脈衝並以光熔化引發相變化技術進行快速微影,使非結晶區產生相轉變,以製得大面積結晶區之次微/奈米不同圖案陣列;此外並探討GST薄膜之厚度、均勻性及成份分析等性質。之後利用非結晶/結晶區之不同物理及化學性質,藉由選擇性蝕刻技術,直接製得微/奈米金屬模仁,在研究中應用田口實驗計劃法來降低蝕刻實驗次數,尋找出最佳化實驗參數及探討實驗因子對微/奈米金屬模仁表面粗糙度之影響,最後以壓印技術轉印出微/奈米圖案的高分子結構。
    Appears in Collections:[機械與機電工程學系暨研究所] 研究報告

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