Directional nickel silicide-induced crystallization of amorphous silicon channel under high-density current stressing

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Title:	Directional nickel silicide-induced crystallization of amorphous silicon channel under high-density current stressing
Authors:	Yeh, P.H.;Yu, C.H.;Chen, L.J.
Contributors:	淡江大學物理學系
Keywords:	Doping species effect;Metal-induced crystallization;Current-induced crystallization
Date:	2005-07
Issue Date:	2011-10-24 11:05:47 (UTC+8)
Abstract:	The effects of electric field and doping species on directional crystallization of a-Si channels under high-density current stressing have been investigated. The a-Si channels were implanted by 30 keV View the MathML source or As+ to a dose of 3 × 1015 ions/cm2. A preferential growth of poly-Si from anode toward cathode was found on View the MathML source, As+ and un-implanted a-Si samples. The results indicate that directional growth of poly-Si is caused by the strong electric field effect on positively charged Ni ions under high-density current stressing.
Relation:	Nuclear Instruments and Methods in Physics Research Section B 237, pp.167-173
DOI:	10.1016/j.nimb.2005.04.092
Appears in Collections:	[Graduate Institute & Department of Physics] Journal Article

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