Bonding properties and their relation to residual stress and refractive index of amorphous Ta(N,O) films investigated by x-ray absorption spectroscopy

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Title:	Bonding properties and their relation to residual stress and refractive index of amorphous Ta(N,O) films investigated by x-ray absorption spectroscopy
Authors:	Jan, J. C.;Babu, P. D.;Tsai, H. M.;Pao, C. W.;Chiou, J. W.;Ray, S. C.;Krishna Kumar, K. P.;Pong, W. F.;Tsai, M.-H.;Jong, C. A.;Chin, T. S.
Contributors:	淡江大學物理學系
Keywords:	tantalum compounds;thin films;amorphous state;internal stresses;refractive index;EXAFS;XANES
Date:	2005-04
Issue Date:	2013-05-31 11:31:32 (UTC+8)
Publisher:	College Park: American Institute of Physics
Abstract:	This work presents N, O K-edge x-ray absorption near-edge structure (XANES) and Ta L3-edge extended x-ray absorption fine structure (EXAFS) studies of amorphous Ta(N,O) films prepared with various flow rate ratios of N2/O2. The N and O K-edge XANES and Ta L3-edge EXAFS spectra demonstrate the presence of N2 molecules. These spectra also show that Ta(N,O) films have similar local atomic structure as that of Ta2O5. No evidence of the formation of Ta–N bond was obtained. The intensities of the π* feature in the N K-edge spectra and the features of O 2p–Ta 5d hybridized states were found to correlate with the residual stress and the refractive index, respectively.
Relation:	Applied Physics Letters 86(16), 161910(3pages)
DOI:	10.1063/1.1905784
Appears in Collections:	[Graduate Institute & Department of Physics] Journal Article

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