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    請使用永久網址來引用或連結此文件: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/72614

    題名: Electronic states and structural characterization in single-crystal Fe-Ni-O alloy thin films grown by molecular beam epitaxy
    作者: Chang, C.L.;Chern, G.;Chen, C.L.;Hsieh, H.H.;Dong, C.L.;彭維鋒;Pong, Way-faung;Chao, C.H.;Chien, H.C.;Chang, S.L.;張經霖
    貢獻者: 淡江大學物理學系
    關鍵詞: A. Thin films;C. NEXAFS;C. X-ray scattering;E. Synchrotron radiation
    日期: 1999-01-01
    上傳時間: 2011-10-24 10:41:27 (UTC+8)
    摘要: High quality epitaxial Fe3O4, NiO and a series of Fe1−xNixOy (0<x<1) thin films have been fabricated by molecular beam epitaxy. In situ reflection high energy electron diffraction (RHEED), ex situ X-ray diffraction (XRD), and X-ray absorption spectroscopy (XAS) studies have been carried out. It was observed that the crystal structure of all the Fe1−xNixOy films studied resemble that of the inverse spinel Fe3O4. The lattice spacing along the perpendicular direction as a function of x shows a minimum at x=0.5 instead of a linear variation indicating that the structures are different from a bulk ferrite Fe2NiO4-like phase. The XAS results are consistent with XRD results and further identify the cation distribution in Fe1−xNixOy system as x varies. The mechanism of the formation of the metastable phase and its implication on the magnetic properties of these Fe–Ni–O films are briefly discussed.
    關聯: Solid state communications 109(9), pp.599-604
    DOI: 10.1016/S0038-1098(98)00596-1
    顯示於類別:[物理學系暨研究所] 期刊論文


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