淡江大學機構典藏:Item 987654321/70773
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    題名: A Research on Quick Polishing of CVD Diamond Film
    作者: 趙崇禮;周文成;林夏蓁;簡川于
    貢獻者: 淡江大學機械與機電工程學系
    關鍵詞: Reactive ion etching;Thermo-chemical polishing;CVD diamond film
    日期: 2006-11
    上傳時間: 2011-10-23 21:45:49 (UTC+8)
    出版者: 中國材料科學學會
    摘要: Polycrystalline CVD diamond film possesses many outstanding physical and mechanical properties which make it a very important engineering material. However, high hardness value and extreme brittleness have made CVD diamond a very difficult material to be machined by conventional grinding and polishing process. In this present study, the diamond wafer was pre-treated with RIE before it was thermo-chemically polished. It was found when diamond wafer was ion-etched in O2 (25 min, 200W, 50sccm), the top layer pyramidal diamond crystals were anisotropically etched into micro-pillar structures. These micro-pillars have significantly weakened the structure of diamond grains and paved the way for subsequent thermo-chemical polishing. Based on the obtained results, this method has great potential to be applied to speed up the polishing process of CVD diamond films in the future.
    關聯: 2006年中國材料科學學會年會論文集, 4p.
    DOI: 10.4028/www.scientific.net/KEM.364-366.668
    顯示於類別:[機械與機電工程學系暨研究所] 會議論文

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