A Research on Quick Polishing of CVD Diamond Film

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Title:	A Research on Quick Polishing of CVD Diamond Film
Authors:	趙崇禮;周文成;林夏蓁;簡川于
Contributors:	淡江大學機械與機電工程學系
Keywords:	Reactive ion etching;Thermo-chemical polishing;CVD diamond film
Date:	2006-11
Issue Date:	2011-10-23 21:45:49 (UTC+8)
Publisher:	中國材料科學學會
Abstract:	Polycrystalline CVD diamond film possesses many outstanding physical and mechanical properties which make it a very important engineering material. However, high hardness value and extreme brittleness have made CVD diamond a very difficult material to be machined by conventional grinding and polishing process. In this present study, the diamond wafer was pre-treated with RIE before it was thermo-chemically polished. It was found when diamond wafer was ion-etched in O2 (25 min, 200W, 50sccm), the top layer pyramidal diamond crystals were anisotropically etched into micro-pillar structures. These micro-pillars have significantly weakened the structure of diamond grains and paved the way for subsequent thermo-chemical polishing. Based on the obtained results, this method has great potential to be applied to speed up the polishing process of CVD diamond films in the future.
Relation:	2006年中國材料科學學會年會論文集, 4p.
DOI:	10.4028/www.scientific.net/KEM.364-366.668
Appears in Collections:	[Graduate Institute & Department of Mechanical and Electro-Mechanical Engineering] Proceeding

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