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    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/65521

    Title: CFD simulation of the two-phase flow for a falling film microreactor
    Authors: Ho, Chii-Dong;Chang, Hsuan;Chen, Hsi-Jen;Chang, Cheng-Liang;Li, Hsieh-Hsung;Chang, Yin-Yu
    Contributors: 淡江大學化學工程與材料工程學系
    Keywords: Falling film;Microreactor;Two-phase flow;Computational fluid dynamics;Volume of fluid
    Date: 2011-07-01
    Issue Date: 2011-10-21 16:38:57 (UTC+8)
    Publisher: Kidlington: Pergamon
    Abstract: Falling film microreactors, which provide very high specific interfacial area, have become a promising solution to the fast and strongly exothermic/endothermic gas–liquid reaction systems. A computational fluid dynamic simulation of the two-phase flow for a falling film microreactor is presented using the volume of fluid (VOF) model. The hydrodynamic characteristics, from both 2-D and 3-D simulations, including liquid film thickness, velocity, pressure and shear stress profiles, are analyzed. 2-D simulation is adopted for the study of the relationship of liquid flow rate and film thickness, as well as the effects of gas flow rate, surface tension, liquid viscosity and pressure difference on the liquid flow rate. 3-D simulation is necessary to provide the comprehensive flow profiles. Although the system is in the laminar flow regime, the liquid film features a wavy structure and the velocity profiles are complex.
    Relation: International Journal of Heat and Mass Transfer 54(15-16), pp.3740-3748
    DOI: 10.1016/j.ijheatmasstransfer.2011.03.015
    Appears in Collections:[Graduate Institute & Department of Chemical and Materials Engineering] Journal Article

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