Research on Fabricating CVD Diamond Microstructures Using RIE Process

doi:10.4028/www.scientific.net/KEM.407-408.41

淡江大學機構典藏 > 工學院 > 機械與機電工程學系暨研究所 > 期刊論文 > Item 987654321/65378

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題名:	Research on Fabricating CVD Diamond Microstructures Using RIE Process
作者:	Chou, Wen-chen;Chao, Choung-lii;Fan, Wei-haw;Ma, Kung-jeng
貢獻者:	淡江大學機械與機電工程學系
關鍵詞:	CVD Diamond;Mask;Microstructure;RIE
日期:	2009-02
上傳時間:	2011-10-20 21:44:41 (UTC+8)
出版者:	Stafa-Zurich: Trans Tech Publications Ltd.
摘要:	Diamond is one of the most important engineering materials for its extreme hardness, high thermal conductivity value and chemical inertness. Due to its high hardness and strength, it can be ideal candidates for AFM probe or micro-needle. In this research, micro cone-like shaped diamond tips with high aspect ratio formed using reactive ion etching (RIE) method. The scanning electron microscope (SEM), transmission electron microscope (TEM) and micro-Raman spectroscopy were used to study the surface morphology and sub-surface micro-structure before and after RIE process. The results showed that gold could be adopted as mask material during the RIE process. Different microstructures could be obtained using different RIE parameters such as etch duration and reactant gas. After RIE (O2 50sccm, 200W) for 5min the micro cone-like structures (aspect ratio~8) could be observed on the surface if a thin layer of gold was applied as mask. However, under the same RIE conditions, the irregular pillar-like microstructures started to emerge if the etching time was stretched longer.
關聯:	Key Engineering Materials 407-408, pp.41-44
DOI:	10.4028/www.scientific.net/KEM.407-408.41
顯示於類別:	[機械與機電工程學系暨研究所] 期刊論文 [資訊工程學系暨研究所] 期刊論文

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