Manufacture of micromirror arrays using a CMOS-MEMS Technique

doi:10.3390/s90806219

機構典藏 > College of Engineering > Graduate Institute & Department of Mechanical and Electro-Mechanical Engineering > Journal Article > Item 987654321/65336

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Title:	Manufacture of micromirror arrays using a CMOS-MEMS Technique
Authors:	Kao, Pin-Hsu;Dai, Ching-Liang;Hsu, Cheng-Chih;Wu, Chyan-Chyi
Contributors:	淡江大學機械與機電工程學系
Keywords:	micromirror array;microactuator;CMOS-MEMS
Date:	2009-04
Issue Date:	2011-10-20 21:41:20 (UTC+8)
Publisher:	Basel: M D P I AG
Abstract:	In this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS (microelectromechanical system) motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55° when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz.
Relation:	Sensors 9(8), pp.6219-6231
DOI:	10.3390/s90806219
Appears in Collections:	[Graduate Institute & Department of Mechanical and Electro-Mechanical Engineering] Journal Article

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