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    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/65336


    Title: Manufacture of micromirror arrays using a CMOS-MEMS Technique
    Authors: Kao, Pin-Hsu;Dai, Ching-Liang;Hsu, Cheng-Chih;Wu, Chyan-Chyi
    Contributors: 淡江大學機械與機電工程學系
    Keywords: micromirror array;microactuator;CMOS-MEMS
    Date: 2009-04
    Issue Date: 2011-10-20 21:41:20 (UTC+8)
    Publisher: Basel: M D P I AG
    Abstract: In this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS (microelectromechanical system) motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55° when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz.
    Relation: Sensors 9(8), pp.6219-6231
    DOI: 10.3390/s90806219
    Appears in Collections:[機械與機電工程學系暨研究所] 期刊論文

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