Investigation of Thermo-Chemical Polishing of CVD Diamond Film

機構典藏 > College of Engineering > Graduate Institute & Department of Mechanical and Electro-Mechanical Engineering > Journal Article > Item 987654321/65328

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Title:	Investigation of Thermo-Chemical Polishing of CVD Diamond Film
Authors:	Chao, C.L.;Chien, H.H.;Ma, K.J.;Lin, H.Y.
Contributors:	淡江大學機械與機電工程學系
Keywords:	Chemical Vapor Deposition (CVD);Diamond Film;Thermo-Chemical Polishing
Date:	2007-01
Issue Date:	2011-10-20 21:40:46 (UTC+8)
Abstract:	ZnO/Diamond structure has attracted a lot of attentions and heavy investment recently just because diamond has the capability of producing very high surface acoustic wave (around 10,000m/s). In this present study, the microwave chemical vapor deposition (CVD) method was employed to produce diamond films on silicon single crystal. Thermo-chemical polishing experiments were then conducted on the obtained diamond films. The underlying material removal mechanisms, microstructure of the machined surface and related machining conditions were also investigated. Thermo-chemical polishing was proved to be able to remove the diamond film very effectively (4.8μm deep of diamond film was removed in 30 minutes when polishing at 550oC and 5.7m/s). The material removal rate was increased with polishing speed and pressure. Higher polishing temperature would improve the chemical reaction and result in better surface finish.
Relation:	Key Engineering Materials 329, pp.195-200
DOI:	10.4028/www.scientific.net/KEM.329.195
Appears in Collections:	[Graduate Institute & Department of Mechanical and Electro-Mechanical Engineering] Journal Article

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