淡江大學機構典藏:Item 987654321/65062
English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 62830/95882 (66%)
造訪人次 : 4134159      線上人數 : 688
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
搜尋範圍 查詢小技巧：
  • 您可在西文檢索詞彙前後加上"雙引號"，以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋，建議至進階搜尋限定作者欄位，可獲得較完整資料
    •  進階搜尋


    請使用永久網址來引用或連結此文件: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/65062


    題名: Increasing Detectability in Semiconductor Foundry by Multivariate Statistical Process Control
    作者: Niu, Han-jen;Yang, Chyan;Chang, Chao-jung
    貢獻者: 淡江大學經營決策學系
    關鍵詞: statistical process control (SPC), advance process control (APC), fault detection and classification (FDC), Hotelling T2 , principal component analysis (PCA), semiconductor industry
    日期: 2008-06-01
    上傳時間: 2011-10-20 16:32:47 (UTC+8)
    摘要: Quality has become a key determinant of success in all aspects of modern industries. It is especially prominent in the semiconductor industry. This paper reviews the contributions of statistical analysis and methods to modern quality control and improvement. The two main areas are statistical process control (SPC) and experimentation. The statistical approach is placed in the context of recent developments in quality management, with particular reference to the total quality movement.

    In SPC, Hotelling T2 has been applied in laboratories with good result; however, it is rarely used in mass production, especially in the semiconductor industry. An advance process control (APC) of R&D study, involving Hotelling T2 and principal component analysis (PCA), is performed on a high density plasma chemical vapour deposition (HDP CVD) equipment in the 12-inch wafer fab. The design of experiment (DOE) of gas flow and RF power effects is used to work the feasibility of PCA for SPC and examine the correlation among tool parameters. In this work, the Hotelling T2 model is shown to be sensitive to variations as small as (+/ − )5% in the tool parameters. Compared with classical PDCA and qualitative analysis, applying statistical in process control is more effective and indeed necessary. This model also is especially suitable to the semiconductor industry.
    關聯: Total Quality Management & Business Excellence 19(5), pp.429-440
    DOI: 10.1080/14783360802018079
    顯示於類別:[管理科學學系暨研究所] 期刊論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    Increasing detectability in semiconductor foundry by multivariate statistical process control.pdf590KbAdobe PDF27檢視/開啟
    index.html0KbHTML16檢視/開啟

    在機構典藏中所有的資料項目都受到原著作權保護.

    TAIR相關文章

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - 回饋