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https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/61573
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| 題名: | Effect of Nano-Ni Catalyst on the Growth and Characterization of Diamond Films by HFCVD |
| 作者: | Teng, Chien-chung;Ku, Feng-chi;Sung, Chien-min;Deng, Jin-pei;Chien, Su-fang;Song, Shin-min;Lin, Chhiu-tsu |
| 貢獻者: | 淡江大學化學學系 |
| 日期: | 2010-05 |
| 上傳時間: | 2011-10-15 23:18:04 (UTC+8) |
| 出版者: | New York: Hindawi Publishing Corporation |
| 摘要: | Four different catalysts, nanodiamond seed, nano-Ni, diamond powder, and mixture of nano-Ni/diamond powder, were used to activate Si wafers for diamond film growth by hot-filament CVD (HFCVD). Diamond crystals were shown to grow directly on both large diamond powder and small nanodiamond seed, but a better crystallinity of diamond film was observed on the ultrasonicated nanodiamond seeded Si substrate. On the other hand, nano-Ni nanocatalysts seem to promote the formation of amorphous carbon but suppress transpolyacetylene (t-PA) phases at the initial growth of diamond films. The subsequent nucleation and growth of diamond crystals on the amorphous carbon layer leads to generation of the spherical diamond particles and clusters prior to coalescence into continuous diamond films based on the CH3 addition mechanism as characterized by XRD, Raman, ATR/FT-IR, XPS, TEM, SEM, and AFM techniques. Moreover, a 36% reduction in surface roughness of diamond film assisted by nano-Ni catalyst is quite significant. |
| 關聯: | Journal of Nanomaterials 2010, 365614(8pages) |
| DOI: | 10.1155/2010/365614 |
| 顯示於類別: | [化學學系暨研究所] 期刊論文
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