Synthesis of UV-curable/alkali-soluble dispersants used for black photoresist with a high loading of carbon black

doi:10.1002/app.31304

淡江大學機構典藏 > 工學院 > 化學工程與材料工程學系暨研究所 > 期刊論文 > Item 987654321/60171

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题名:	Synthesis of UV-curable/alkali-soluble dispersants used for black photoresist with a high loading of carbon black
作者:	Kuo, Kuo-Huai;Chiu, Wen-Yen;Don, Trong-Ming
贡献者:	淡江大學化學工程與材料工程學系
关键词:	carbon black;dispersions;photoresists
日期:	2010-05
上传时间:	2011-10-13 13:08:47 (UTC+8)
出版者:	Hoboken: John Wiley & Sons, Inc.
摘要:	This research synthesized a functional dispersant, not only providing a good dispersion of carbon black (CB) but also possessing ultraviolet (UV)-curable and alkali-soluble properties, by a two-step process. Firstly, bisphenol-A epoxy diacrylate was reacted with benzophenone tetracarboxylic dianhydride at different molar ratios to obtain UV-curable/alkali-soluble resins. In the second step, these resins would possess dispersion ability of CB by reaction with an isocyanate-containing methacrylate. The prepared dispersants were evaluated by their dispersion ability and the light absorption property of CB. The results showed that one of the dispersants was able to disperse CB in the solvent up to 10 wt % with a mean particle size about 100 nm. This particular dispersant had a moderate amount of amino-containing groups (such as urethane, amide, and imide) serving as anchoring sites on CB, and a sufficiently long chain (Mn ∼ 2600) to provide a steric repulsion among CB particles. The advantage of this CB/dispersant system is that no other curable resins are needed. By using a suitable photoinitiator, the present CB/dispersant system could reach a polymerization rate of 1.05 × 10−3 (s–1), and a black pattern of 10 μm in width on a glass substrate was obtained through an UV-lithography process.
關聯:	Journal of Applied Polymer Science 115(3), pp.1803–1813
DOI:	10.1002/app.31304
显示于类别:	[化學工程與材料工程學系暨研究所] 期刊論文

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