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    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/58302


    Title: Monolithic n-type conductivity on low temperature grown freestanding ultrananocrystalline diamond films
    Authors: Joseph, P. T.;Tai, N. H.;Lin, I-Nan
    Contributors: 淡江大學物理學系
    Date: 2010-06
    Issue Date: 2011-09-30 22:01:39 (UTC+8)
    Publisher: College Park: American Institute of Physics
    Abstract: We report monolithic n-type conductivity on low-temperature (<570 °C) grown ultrananocrystalline diamond (UNCD) films by Li-diffusion (about 255 nm) from LiNbO3 substrates. Low resistivity of 1.2 Ω cm with carrier concentration of −2×1020 cm−3 is obtained on freestanding UNCD films. The films bonded to Cu-tape show very low turn-on field of 4.2 V/μm with emission current density of above 0.3 mA/cm2 at a low applied filed of 10 V/μm. The n-type conductivity of low-temperature Li-diffused UNCD films overwhelms that of the high-temperature (≥800 °C) nitrogen doped ones and will make a significant impact to diamond-based electronics.
    Relation: Applied Physics Letters 97(4), 042107(3pages)
    DOI: 10.1063/1.3472204
    Appears in Collections:[Graduate Institute & Department of Physics] Journal Article

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