Effect of N2 addition in Ar plasma on the development of microstructure of ultra-nanocrystalline diamond films

淡江大學機構典藏 > 理學院 > 物理學系暨研究所 > 期刊論文 > Item 987654321/58290

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题名:	Effect of N2 addition in Ar plasma on the development of microstructure of ultra-nanocrystalline diamond films
作者:	Wang, Chuan-Sheng;Tong, Ging-Horng;Chen, Huang-Chin;Shih, Wen-Ching;Lin, I-Nan
贡献者:	淡江大學物理學系
关键词:	UNCD;TEM;N2/Ar plasma
日期:	2010-02
上传时间:	2011-09-30 21:59:39 (UTC+8)
出版者:	Lausanne: Elsevier S.A.
摘要:	The effect of the N2 and H2 addition in Ar plasma on the characteristics of the UNCD films was systematically investigated. It is found that, while the N2/Ar plasma results in UNCD films with ultra-small grains (~ 5 nm), incorporation of H2 into the N2/Ar plasma increased monotonously the size of the grains. Moreover, the diamond grains synthesized in H2 free plasma are of equi-axed geometry and those grown in H2-containing plasma are of plate-like one. The optical emission spectroscopic investigation indicated that the increase in electron temperature due to the addition of H2 into Ar plasma is the main cause, altering the microstructure of the UNCD films. As the H2 content increases, the spherical diamond grains first agglomerated to form elongated grains, which coalesce to form dendrite clusters. The proportion of grain boundaries is thus decreased that increased the turn-on field necessary for inducing the electron field emission process.
關聯:	Diamond and Related Materials 19(2–3), pp.147–152
DOI:	10.1016/j.diamond.2009.09.009
显示于类别:	[物理學系暨研究所] 期刊論文

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