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    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/58288

    Title: Effect of CH4/H2 plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique
    Authors: 林諭男;Sharma, Neha;Kumar, N.;Sundaravel, B.
    Contributors: 淡江大學物理學系
    Keywords: Nano-crystalline diamond;Dangling bonds;Coefficient of friction
    Date: 2011-02-01
    Issue Date: 2011-09-30 21:59:20 (UTC+8)
    Abstract: Nano-crystalline diamond coatings were deposited on the silicon substrate using Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD). Experiments were performed by varying the H2 content in CH4/H2 plasma during synthesis. Raman spectral analysis revealed that with decrease in hydrogen content in the CH4 plasma, the ID/IG ratio decreases with the formation of smaller crystallites. Such a film possesses a large grain boundary fraction containing hydrogenated amorphous carbon (a-C:H). During tribological test, sufficient amount of hydrogen present in the grain boundary passivates the dangling σ-bond causing ultra-low friction and extremely low wear evident by improvement in microstructure.
    Relation: Tribology International
    DOI: 10.1016/j.triboint.2011.03.028
    Appears in Collections:[Graduate Institute & Department of Physics] Journal Article

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