Nanoscale surface roughness characterization by full field polarized light-scattering

淡江大學機構典藏 > 工學院 > 機械與機電工程學系暨研究所 > 期刊論文 > Item 987654321/56765

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题名:	Nanoscale surface roughness characterization by full field polarized light-scattering
作者:	Liu, Cheng-yang;Fu, Wei-en;Lin, Tzeng-yow;Chang, Chi-sheng;Chen, Jay-san
贡献者:	淡江大學機械與機電工程學系
关键词:	Bidirectional ellipsometry;Roughness;Light-scattering measurement
日期:	2011-01
上传时间:	2011-09-09 10:16:03 (UTC+8)
出版者:	London: Elsevier Ltd
摘要:	Characterizing surface roughness in nanoscale nondestructively is an urgent need for semiconductor and wafer manufacturing industries. To meet the need, an optical scatter instrument in bidirectional ellipsometry has been developed for characterizing nanoscale surface roughness, in particular, on the wafers after chemical–mechanical polishing. The polarized angular dependence of out-of-plane light-scattering from nanoscale surface roughness is analyzed and characterized. These analysis and characterization results show strong correlations of surface roughness and angular dependence of bidirectional ellipsometric parameters for full field light-scattering. The experimental findings prove good agreement with theoretical predictions for different surface roughnesses. As a result, the nanoscale surface roughness can be accurately measured and characterized by the angular dependence and the polarization of light scattered from surface.
關聯:	Optics and Lasers in Engineering 49(1), pp.145-151
DOI:	10.1016/j.optlaseng.2010.08.004
显示于类别:	[機械與機電工程學系暨研究所] 期刊論文

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