淡江大學機構典藏:Item 987654321/53867
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    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/53867


    Title: 以熱退火程序消除矽晶圓加工後表面殘留應力之裝置
    Authors: 趙崇禮;張毅;林宏彜
    Contributors: 淡江大學機械與機電工程學系
    Date: 2002-02-01
    Issue Date: 2011-05-20 15:36:49 (UTC+8)
    Abstract: 一種以熱退火程序消除矽晶圓加工後表面殘留應力之裝置，其具有一熱處理爐，該熱處理爐包括有絕緣外層、晶圓支撐盤、紅外線光源及石英管構成，該絕緣外層上設有進氣口及出氣口，晶圓支撐盤、紅外線光源及石英管係設置於絕緣外層內部，晶圓支撐盤位於石英管內，紅外線光源設於石英管上、下方；藉此，可利用熱處理(退火)程序來去除矽晶圓經加工過程中所產生之殘留應力，用以取代傳統製程中以化學腐蝕的方式來去除殘留應力。
    Appears in Collections:[Graduate Institute & Department of Mechanical and Electro-Mechanical Engineering] Patent

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