淡江大學機構典藏:Item 987654321/53708
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    题名: Batch Sequencing for Run-to-Run Control: Application to Chemical Mechanical Polishing
    作者: Chen, Yih-hang;Su, An-jhih;Shiu, Sheng-jyh;Yu, Cheng-ching;Shen, Shih-haur
    贡献者: 淡江大學化學工程與材料工程學系
    日期: 2005-01
    上传时间: 2011-05-20 09:56:17 (UTC+8)
    出版者: American Chemical Society
    摘要: This work compliments and extends the capability of the run-to-run (R2R) control by sequencing the incomings such that improved control performance can be achieved. Unlike chemical or mechanical systems, this is important for semiconductor manufacturing processes because some prior information about the incoming wafers is generally available. First, the limitation of a R2R control type of feedback system is explained. The frequency domain explanation is as follows: a negative feedback system is effective rejecting a low-frequency type of disturbance. From the feedback property, then the answer to the feed sequencing problem becomes clear: arrange the feed (which we are capable of doing) in such a way that it gives a low-frequency characteristic. Furthermore, a scalar load strength indicator is derived, and an engineering approach is taken to sort the incomings effectively. Two policies, from thin to thick (in terms of prethickness, policy L2R) and from thick to thin (policy R2L), are proposed, and they are shown to provide a better control performance over the conventional random feed policy (R). The feed sequencing problems are tested for systems with different dimensions, e.g., single input single output, single input multiple output, and multiple input multiple output systems, which include the model of an experimental chemical mechanical polishing process, and the results show that an improved control performance can be obtained simply by arranging the feeds.
    關聯: Industrial & Engineering Chemistry Research 44(13), pp4676-4686
    DOI: 10.1021/ie0491544
    显示于类别:[化學工程與材料工程學系暨研究所] 期刊論文

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