淡江大學機構典藏:Item 987654321/53701
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    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/53701


    Title: Characterization of Acrylic Copolymers Applied in Negative-type Photoresist via a Ternary Composition Diagram
    Authors: Lee, Chih-kang;Don, Trong-ming;Lin, Dar-jong;Chen, Chin-chung;Cheng, Liao-ping
    Contributors: 淡江大學化學工程與材料工程學系
    Keywords: Acrylic copolymer;Binder;Ternary composition diagram;Negative-type photoresist;Copolymerization;Photoresists
    Date: 2008-03
    Issue Date: 2011-05-20 09:55:59 (UTC+8)
    Publisher: Hoboken: John Wiley & Sons, Inc.
    Abstract: Three-component acrylic copolymers used as a binder for negative-type photoresists were synthesized and characterized. First, free radical polymerization was employed to synthesize two-component binders, i.e., acrylic ester copolymers with different ratios of benzyl methacrylate (BZMA) and methacrylic acid (MAA). Thermal behavior, viscosity and molecular weight of the prepared two-component binders were studied. Then, a series of three-component binders were prepared through incorporation of another monomer, 2-hydroxyethyl methacrylate (2-HEMA). FTIR was used to examine the evolution of chemical bonds at various stages of the synthetic process. Thermal analyses, TGA and DSC, were used to evaluate the level of enhancement on thermal stabilities of the prepared three-component binders. Finally, an optimal region in the ternary composition diagram of BZMA, MAA, and 2-HEMA can be identified by comparing the results of acid value, viscosity, and molecular weight of the binder. A negative-type photoresist was prepared using an optimized composition, for which resolution of the circuit could reach the level of 6 μm.
    Relation: Journal of Applied Polymer Science 109, pp.467-474
    DOI: 10.1002/app.28157
    Appears in Collections:[Graduate Institute & Department of Chemical and Materials Engineering] Journal Article

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