Preparation and properties of Nano-silica Modified Negative Acrylate Photoresist

doi:10.1016/j.tsf.2008.04.051

淡江大學機構典藏 > 工學院 > 化學工程與材料工程學系暨研究所 > 期刊論文 > Item 987654321/50475

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題名:	Preparation and properties of Nano-silica Modified Negative Acrylate Photoresist
作者:	Lee, Chih-kang;Don, Trong-ming;Lai, Wei-chi;Chen, Chin-chung;Lin, Dar-jong;Cheng, Liao-ping
貢獻者:	淡江大學化學工程與材料工程學系
關鍵詞:	Photoresist;Binder;Sol–gel method;Organic–inorganic nanohybrid
日期:	2008-10
上傳時間:	2010-08-09 18:02:39 (UTC+8)
出版者:	Lausanne: Elsevier S.A.
摘要:	A series of silica modified photoresists had been successfully developed through incorporation of a particular nanoparticles suspension. Free radical polymerization was employed to synthesize the binder, an acrylate copolymer resin of benzyl methacrylate, methacrylic acid and 2-hydroxyethyl methacrylate, of the photoresist. The acid value, viscosity, molecular weight and thermal properties of the formed binders were measured. Then, surface-modified silica particles prepared by the sol–gel method were introduced to the photoresist. Because the modified silica particles contained considerable amount of reactive double bonds (CC) on their surfaces, they would react with the polyfunctional monomers in the photoresist to form an organic–inorganic nanohybrid. Fourier transform infrared spectrometer was used to analyze the evolution of chemical bonds at various stages of the preparation process. Thermal analyses including thermal gravimetric analyzer, differential scanning calorimeter and thermo-mechanical analyzer were used to evaluate the level of enhancement on thermal and dimensional stabilities of the photoresist due to silica incorporation.
關聯:	Thin Solid Films 516(23), pp. 8399-8407
DOI:	10.1016/j.tsf.2008.04.051
顯示於類別:	[化學工程與材料工程學系暨研究所] 期刊論文

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