Oxidation of methyl methacrylate from semiconductor wastewater by O3 and O3/UV processes

doi:10.1016/j.jhazmat.2007.01.004

淡江大學機構典藏 > 工學院 > 土木工程學系暨研究所 > 期刊論文 > Item 987654321/50460

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题名:	Oxidation of methyl methacrylate from semiconductor wastewater by O3 and O3/UV processes
作者:	Shang, Neng-chou;Chen, Yi-hung;Ma, Hwong-wen;Lee, Chi-wei;Chang, Cheng-hsin;Yu, Yue-hwa;Lee, Chien-hsien
贡献者:	淡江大學土木工程學系
关键词:	Ozone;UV radiation;Methyl methacrylate;Ozonation;Semiconductor
日期:	2007-08
上传时间:	2010-08-09 17:57:50 (UTC+8)
出版者:	Amsterdam: Elsevier BV
摘要:	This study investigated the oxidation of methyl methacrylate (MMA) by sole ozonation and ozone/UV treatments. The semi-batch ozonation experiments were proceeded under different reaction conditions to study the effects of ozone dosage and UV radiation on the oxidation of MMA. The experimental results indicated that both the oxidation of MMA by the sole ozonation and O3/UV processes can completely decompose MMA to form the following intermediates within 30 min reaction time. To increase the applied ozone dosage can significantly raise the removal efficiency of MMA. However, the mineralization of MMA via the direct oxidation reaction of molecular ozone was slow, while introducing the UV radiation can promote the mineralization rate of MMA. In addition, the pH value of the oxidized solution in the O3/UV treatment decreased lower than that in the sole ozonation treatment of about 1 unit. The possible scheme of the decomposition pathway of MMA under the ozonation process is proposed in this study. Formic acid and acetic acid were found to be the main ozonated intermediates.
關聯:	Journal of Hazardous Materials 147(1-2), pp.307-312
DOI:	10.1016/j.jhazmat.2007.01.004
显示于类别:	[土木工程學系暨研究所] 期刊論文

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