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    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/50460


    Title: Oxidation of methyl methacrylate from semiconductor wastewater by O3 and O3/UV processes
    Authors: Shang, Neng-chou;Chen, Yi-hung;Ma, Hwong-wen;Lee, Chi-wei;Chang, Cheng-hsin;Yu, Yue-hwa;Lee, Chien-hsien
    Contributors: 淡江大學土木工程學系
    Keywords: Ozone;UV radiation;Methyl methacrylate;Ozonation;Semiconductor
    Date: 2007-08
    Issue Date: 2010-08-09 17:57:50 (UTC+8)
    Publisher: Amsterdam: Elsevier BV
    Abstract: This study investigated the oxidation of methyl methacrylate (MMA) by sole ozonation and ozone/UV treatments. The semi-batch ozonation experiments were proceeded under different reaction conditions to study the effects of ozone dosage and UV radiation on the oxidation of MMA. The experimental results indicated that both the oxidation of MMA by the sole ozonation and O3/UV processes can completely decompose MMA to form the following intermediates within 30 min reaction time. To increase the applied ozone dosage can significantly raise the removal efficiency of MMA. However, the mineralization of MMA via the direct oxidation reaction of molecular ozone was slow, while introducing the UV radiation can promote the mineralization rate of MMA. In addition, the pH value of the oxidized solution in the O3/UV treatment decreased lower than that in the sole ozonation treatment of about 1 unit. The possible scheme of the decomposition pathway of MMA under the ozonation process is proposed in this study. Formic acid and acetic acid were found to be the main ozonated intermediates.
    Relation: Journal of Hazardous Materials 147(1-2), pp.307-312
    DOI: 10.1016/j.jhazmat.2007.01.004
    Appears in Collections:[土木工程學系暨研究所] 期刊論文

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