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    題名: Characteristics of proton-exchanged wet etching on z-cut nickel-indiffused lithium niobate
    作者: 張文清;Chang, Wen-ching;Chang, Shih-jung;Sue, Chao-yung;Hsu, Chia-lu
    貢獻者: 淡江大學電機工程學系
    日期: 1998-07-01
    上傳時間: 2010-03-26 22:12:11 (UTC+8)
    出版者: Wiley-Blackwell
    摘要: In this letter, the wet etching technique is utilized to determine the proton exchange (PE) depth of z-cut nickel-indiffused lithium niobate under different nickel indiffusion parameters. It is demonstrated that the existence of nickel atoms reduces the PE depth. While this result was applied to the fabrication of a ridge-type waveguide, the tilt angle of the sidewall on the ridge waveguide was about 70°, which has been successfully increased. © 1998 John Wiley & Sons, Inc. Microwave Opt Technol Lett 18: 250–252, 1998.
    關聯: Microwave and optical technology letters 18(4), pp.250-252
    DOI: 10.1002/(SICI)1098-2760(199807)18:4<250::AID-
    顯示於類別:[電機工程學系暨研究所] 期刊論文

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