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    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/45829


    Title: Photo-patternable gelatin as protection layers in low-temperature surface micromachinings
    Authors: Yang, Lung-Jieh;Lin, W. Z.;Yao, T. J.;Tai, Y. C.
    Contributors: 淡江大學機械與機電工程學系
    Keywords: Chemical resistance;Low temperature operations;Microelectromechanical devices;Microstructure;Photoresists;Protective coatings;Stiction;Thick films;Gelatin;Micromachining
    Date: 2003-01
    Issue Date: 2013-08-08 14:51:19 (UTC+8)
    Publisher: Lausanne: Elsevier S.A.
    Abstract: This paper describes a newly developed low temperature photo-patternable gelatin technology that is useful to produce a thick (>10 μm) gelatin protecting and strengthening layer for weak MEMS microstructures. Example demonstrated here is the gelatin process integrated with the parylene MEMS technology. The complete processing details and formulae are reported and allow anyone to use gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications.
    Relation: Sensors and Actuators, A: Physical 103(1-2), pp.284-290
    DOI: 10.1016/S0924-4247(02)00338-2
    Appears in Collections:[機械與機電工程學系暨研究所] 期刊論文

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