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    題名: Photo-patternable gelatin as protection layers in low-temperature surface micromachinings
    作者: Yang, Lung-Jieh;Lin, W. Z.;Yao, T. J.;Tai, Y. C.
    貢獻者: 淡江大學機械與機電工程學系
    關鍵詞: Chemical resistance;Low temperature operations;Microelectromechanical devices;Microstructure;Photoresists;Protective coatings;Stiction;Thick films;Gelatin;Micromachining
    日期: 2003-01
    上傳時間: 2013-08-08 14:51:19 (UTC+8)
    出版者: Lausanne: Elsevier S.A.
    摘要: This paper describes a newly developed low temperature photo-patternable gelatin technology that is useful to produce a thick (>10 μm) gelatin protecting and strengthening layer for weak MEMS microstructures. Example demonstrated here is the gelatin process integrated with the parylene MEMS technology. The complete processing details and formulae are reported and allow anyone to use gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications.
    關聯: Sensors and Actuators, A: Physical 103(1-2), pp.284-290
    DOI: 10.1016/S0924-4247(02)00338-2
    顯示於類別:[機械與機電工程學系暨研究所] 期刊論文

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