CMOS microelectromechanical bandpass filters

淡江大學機構典藏 > 工學院 > 機械與機電工程學系暨研究所 > 期刊論文 > Item 987654321/45827

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题名:	CMOS microelectromechanical bandpass filters
作者:	楊龍杰;Yang, Lung-jieh;Huang, Tsung-wei;Chang, Pei-zen
贡献者:	淡江大學機械與機電工程學系
关键词:	Microelectromechanical filter;CMOS;Maskless;Monolithic integration
日期:	2001-05-01
上传时间:	2010-03-26 20:05:35 (UTC+8)
出版者:	Elsevier
摘要:	This work fabricates a laminated-suspension microelectromechanical filter, respectively, by a fully compatible CMOS 0.6 μm single poly triple metal (SPTM) process and CMOS 0.35 μm single poly quadri-metal (SPQM) process. Experimentally, due to the top metal layer being used as the etch-resistant mask during the subsequent dry etching. Therefore, this study performs maskless etching with plasma and obtains excellent results including high selectivity and full release of the structure. Additionally, the microelectromechanical filter can be driven by applying low-voltage of around 5 V and a measured center frequency of around 13.1 kHz and a quality factor of around 1871 were obtained for a single-comb resonator operated in air. The filter successful proposed herein has a monolithic integration capability with the relative electric circuits in the standard CMOS 0.35 μm process.
關聯:	Sensors and Actuators A: Physical 90(1-2), pp.148-152
DOI:	10.1016/S0924-4247(01)00451-4
显示于类别:	[機械與機電工程學系暨研究所] 期刊論文

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