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    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/42025


    Title: Transparent ultrananocrystalline diamond films on quartz substrate
    Authors: Joseph, P. T.;Tai, Nyan-hwa;Chen, Yi-chun;Cheng, Hsiu-fung;林諭男;Lin, I-nan
    Contributors: 淡江大學物理學系
    Keywords: UNCD;MPECVD;Transmittance
    Date: 2008-04-01
    Issue Date: 2010-02-23 14:16:00 (UTC+8)
    Publisher: Elsevier
    Abstract: Highly transparent ultrananocrystalline diamond (UNCD) films were deposited on quartz substrates using microwave plasma enhanced chemical vapor deposition (MPECVD) method. Low temperature growth of high quality transparent UNCD films was achieved by without heating the substrates prior to the deposition. Additionally, a new method to grow NCD and microcrystalline diamond (MCD) films on quartz substrates has been proposed. Field emission scanning electron microscopy (FESEM) and Raman spectroscopy were used to analyze the surface and structural properties of the films. The surface morphology of UNCD film shows very smooth surface characteristics. The transparent property studies of UNCD film on quartz substrate showed 90% transmittance in the near IR region. The transparent and dielectric properties of UNCD, NCD, and MCD films on quartz substrates were compared and reported.
    Relation: Diamond and Related Materials 17(4-5), pp.476-480
    DOI: 10.1016/j.diamond.2007.10.013
    Appears in Collections:[Graduate Institute & Department of Physics] Journal Article

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