Effect of surface treatments on the electronic properties of ultra-nanocrystalline diamond films

淡江大學機構典藏 > 理學院 > 物理學系暨研究所 > 期刊論文 > Item 987654321/42022

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題名:	Effect of surface treatments on the electronic properties of ultra-nanocrystalline diamond films
作者:	Dong, C. L.;Chen, S. S.;Chiou, J. W.;Chen, Y. Y.;Guo, J.-H.;Cheng, H. F.;Lin, I. N.;張經霖;Chang, Ching-lin
貢獻者:	淡江大學物理學系
關鍵詞:	Nanocrystalline diamond;X-ray absorption;X-ray emission
日期:	2008-07
上傳時間:	2010-08-10 09:43:52 (UTC+8)
出版者:	Lausanne: Elsevier S.A.
摘要:	We present the soft x-ray spectroscopic study of the ultra-nanocrystalline diamond (UNCD) films with different surface treatments. The samples were prepared by means of microwave plasma enhanced chemical vapor deposition (MPECVD) and the different surface treatments are applied to alter their field emission properties. The electronic properties were subsequently examined by the soft x-ray absorption and x-ray emission spectroscopy at carbon 1s threshold. From the experimental results, there is no significant variation in electronic structure of oxygen- and hydrogen-plasma treated UNCD films. On the other hand, the biased treated UNCD film shows more remarkable change on the sp2 and sp3 states. The formation of sp2 bonding and the reduction of sp3 bonding are the consequence of the improved electron field emission properties.
關聯:	Diamond and Related Materials 17(7-10), pp.1150-1153
DOI:	10.1016/j.diamond.2007.12.001
顯示於類別:	[物理學系暨研究所] 期刊論文

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