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    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/42016

    Title: The Effect of Ion Implantation on Field Emission Property of Nanodiamond Films
    Authors: Chen, Huang-chin;Palnitkar, Umesh;Niu, Huan;Cheng, Hsiu-fung;林諭男;Lin, I-nan
    Contributors: 淡江大學物理學系
    Keywords: implantation;nanocrystalline diamond
    Date: 2008-08-01
    Issue Date: 2010-08-10 09:31:08 (UTC+8)
    Publisher: American Scientific Publishers
    Abstract: Nanocrystalline diamond films prepared by microwave plasma enhanced chemical vapor deposition (MPECVD) were implanted using 110 keV nitrogen ions under fluence ranging from 10(13)-10(14) ions/cm2. Scanning Electron Microscopy (SEM) and Raman spectroscopy were used to analyze the changes in the surface of the films before and after ion implantation. Results show that with nitrogen ion implantation in nanocrystalline diamond film cause to decrease in diamond crystallinity. The field emission measurement shows a sharp increase in current density with increase in dose. The ion implantation also alters the turn on field. It is observed that the structural damage caused by ion implantation plays a significant role in emission behaviour of nanocrystalline diamonds.
    Relation: Journal of Nanoscience and Nanotechnology 8(8), pp.4141-4145
    DOI: 10.1166/jnn.2008.AN50
    Appears in Collections:[Graduate Institute & Department of Physics] Journal Article

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