English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 49378/84106 (59%)
造訪人次 : 7378069      線上人數 : 81
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋
    請使用永久網址來引用或連結此文件: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/38061


    題名: Photo-patternable gelatin as protection layers in surface micromachinings
    作者: Yang, Lung-jieh;Lin, Wei-zhi;Yao, Tze-jung;Tai, Yu-chong
    貢獻者: 淡江大學機械與機電工程學系
    日期: 2002
    上傳時間: 2010-04-15 10:36:55 (UTC+8)
    出版者: N.Y.: Institute of Electrical and Electronic Engineers (IEEE)
    摘要: This paper describes a newly developed low-temperature photo-patternable Gelatin technology that is useful to produce a thick (greater than 10 microns) Gelatin protecting and strengthening layer for weak MEMS micro-structures. Example demonstrated here is the Gelatin process integrated with the Parylene MEMS technology. What is reported here is the complete processing details and formulae that allow anyone to use Gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications.
    關聯: Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on, pp.471-474
    顯示於類別:[機械與機電工程學系暨研究所] 會議論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML281檢視/開啟
    Photo-patternable gelatin as protection layers in surface micromachinings.pdf731KbAdobe PDF290檢視/開啟

    在機構典藏中所有的資料項目都受到原著作權保護.

    TAIR相關文章

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - 回饋