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    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/38061


    Title: Photo-patternable gelatin as protection layers in surface micromachinings
    Authors: Yang, Lung-jieh;Lin, Wei-zhi;Yao, Tze-jung;Tai, Yu-chong
    Contributors: 淡江大學機械與機電工程學系
    Date: 2002
    Issue Date: 2010-04-15 10:36:55 (UTC+8)
    Publisher: N.Y.: Institute of Electrical and Electronic Engineers (IEEE)
    Abstract: This paper describes a newly developed low-temperature photo-patternable Gelatin technology that is useful to produce a thick (greater than 10 microns) Gelatin protecting and strengthening layer for weak MEMS micro-structures. Example demonstrated here is the Gelatin process integrated with the Parylene MEMS technology. What is reported here is the complete processing details and formulae that allow anyone to use Gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications.
    Relation: Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on, pp.471-474
    Appears in Collections:[機械與機電工程學系暨研究所] 會議論文

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