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    题名: 以常壓空氣電漿及反應離子蝕刻製作鑽石微結構之研究
    其它题名: Investigation of fabricating micro/nano-structures on CVD diamond film by air plasma and reactive ion etching
    作者: 林夏蓁;Lin, Hsia-chen
    贡献者: 淡江大學機械與機電工程學系碩士班
    趙崇禮;Chao, Choung-lii
    关键词: CVD鑽石膜;反應離子蝕刻;空氣電漿;微結構;Chemical vapor deposition;reactive ion etching;air plasma;microstructure
    日期: 2007
    上传时间: 2010-01-11 06:31:50 (UTC+8)
    摘要: 由於鑽石具有極佳的化學與物理特性使其成為重要的工程材料之ㄧ,其中尤以CVD鑽石膜極具應用之潛力。本論文分別以反應離子蝕刻(RIE)及常壓空氣電漿(APAP)對CVD鑽石膜表面進行處理,並對加工後的表面微結構進行分析探討。由於鑽石具有高化學穩定性、高熱傳導係數、低熱膨脹係數與高熔點且耐高溫之特性,具有開發製作微模具之潛力,但因鑽石膜表面粗糙度較高,不適合直接作為高表面精度要求的相關應用,本論文採用RIE及APAP處理鑽石膜表面所產生的微結構,經實驗證實有助於結合熱化學拋光法來快速改善鑽石膜的表面粗糙度。本論文中分別以表面粗度儀(α-step)、掃描式電子顯微鏡(SEM)、光學顯微鏡(OM)與拉曼頻譜儀(RAMAN)來檢測CVD鑽石膜之表面形貌變化與成分分析,並進行相關微結構形成之機制探討。此外,研究結果發現若於鑽石膜表面鍍金後再利用RIE處理,鑽石晶面上也會被蝕刻出類似微柱狀物之結構,且鍍金時間越久該結構越明顯。論文中並以鑽石微結構對高分子材料PMMA進行熱壓印研究,證實所產生的微結構也可應用於奈米壓印上。
    Diamond has many outstanding physical and chemical properties such as extreme hardness, low friction coefficient, high thermal conductivity, high mechanical strength, and high optical transparency. Therefore, several potential applications can be anticipated in electronics, optics, protective corrosion resistant coatings. In recent years, using chemical vapor deposition (CVD) methods to synthesize polycrystalline diamond is a mature and popular technology. This study not only indicated the producing mechanism of these microstructures on CVD diamond grains by atmospheric pressure air plasma (APAP) and reactive ion etching, but also used these microstructures applying to the thermal-chemical polishing and nano-imprint process. Scanning electron microscope, micro-Raman spectroscopy and α-step were used to study the surface morphology and component analysis, respectively. From the results showed that the microstructures could be successfully combined the thermal-chemical polishing method and these microstructures had a potential to apply in nano-imprint process.
    显示于类别:[機械與機電工程學系暨研究所] 學位論文

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